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Plasma Ion Assist Co., LTD.
Plasma Ion Assist Co., LTD.
Our innovative PIAD technology uses ion implantation to apply a DLC film to the surface of materials, giving them a variety of high functionalities, including sliding properties, abrasion resistance, gas barrier properties, insulation, and electrical conductivity. Our technology features low-temperature film forming, and unlike those from other companies, it can be used for non-metallic, rubber, and resin materials. We have also developed a large-volume plasma ICP source and integrated it into mass production equipment for fuel cell metal separators and various types of films, contributing to a significant reduction in film-forming costs.
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SDGs we are working on
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SDGs we are working on
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Our core technology is the application of plasma ion implantation and film forming technology to enhance the surface of components with high functionality. By coating the surface of target base materials with DLC, it is possible to add various functionalities such as sliding properties, abrasion resistance, and gas barrier properties. Target materials can include metals, nonmetals, rubber, and resins. With the support of the New Energy and Industrial Technology Development Organization (NEDO), we have now begun the development of a large-volume plasma ICP source. This technology enables in-line, high-speed film formation on stainless steel and aluminum separators, significantly lowering the cost of metal separators for fuel cells in the fuel cell market, which is expected to become increasingly important in the future.